Global CMP Polishing Materials Market 2021 research report offers qualitative and quantitative insights in relation to industry growth rate, market segmentation, CMP Polishing Materials market size, demand and revenue. The current CMP Polishing Materials market trends that are expected to influence the future prospects of the industry are analyzed in the report. The report further investigates and assesses the current landscape of the ever-evolving business sector and the present and future effects of COVID-19 on the market.
The Global CMP Polishing Materials Market is expected to grow at a CAGR 6.45% during the forecast period (2021-2027).
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The report presents the market competitive landscape and a corresponding detailed analysis of the major vendor/key players in the market. Top Companies in the Global CMP Polishing Materials Market: 3M, Ace Nanochem, Aion, Anji Microelectronics, Asahi Glass, BASF SE, BrushTek, CMC Materials, Coastal PVA, Cobetter, CP TOOLS, DuPont, Enseigner, Entegris, Ferro (UWiZ Technology), FNS TECH, FUJIBO, Fujifilm, Hitachi Chemical, ITW Rippey, IVT Technologies, JSR Micro Korea Material, JT Baker (Avantor_, Kanto Chemical Company, Inc., KC Tech, Kinik Company, Mitsubishi Chemical Corporation, Morgan Technical Ceramics, Nippon Steel & Sumikin Materials, Pall, Saesol, Saint-Gobain, SemPlastic, LLC, Shinhan Diamond, SKC, Soulbrain, SPM Technology, Stat Clean, TAK Materials Corporation, Technic France, TWI Incorporated, Versum Materials, Victrex, WEC Group, Willbe S&T and others.
Key Developments:
March 2020 – US-based ACM Research Inc. launched the Ultra SFP ap tool for advanced packaging solutions. It leverages ACM’s stress-free polishing (SFP) technology and integrates it with CMP and wet-etch chambers into a single system. It is designed to save more than 80% of slurry for metal polishing in 2.5D and 3D package applications.
January 2020 – Entegris Inc acquired Sinmat, a CMP slurry manufacturer. Sinmat’s Chemical Mechanical Planarization (CMP) slurries are used for polishing ultra-hard surface materials, including SiC (silicon carbide) and GaN (gallium nitride). SiC and GaN are substrates utilized in the fast-growing end markets of power electronics and advanced communications. This acquisition has enhanced the product offerings of Entegris Inc.
Global CMP Polishing Materials Market Split by Product Type and Applications:
This report segments the global CMP Polishing Materials market on the basis of Types are:
CMP Slurry
CMP Pads
CMP Pad Conditoners
CMP Slurry Filter
PVA Brushes
Retaining Rings
Post CMP Cleaning
On the basis of Application, the Global CMP Polishing Materials market is segmented into:
300mm Wafer
200mm Wafer
Others
Regional Analysis For CMP Polishing Materials Market:
Taiwan-based TSMC, the world’s largest contract chipmaker with a more than 50% share in the global market, also plays a significant role in creating demand for the CMP slurries. The growing advancement in the telecom industry, due to 5G and in the automotive industry, is also fuelling the company’s product demand, hence, also developing the scope for the studied market vendors.
North America (The United States, Canada, and Mexico)
Europe (Germany, France, UK, Russia, and Italy)
Asia-Pacific (China, Japan, Korea, India, and Southeast Asia)
South America (Brazil, Argentina, Colombia, etc.)
The Middle East and Africa (Saudi Arabia, UAE, Egypt, Nigeria, and South Africa)
What are the market factors that are explained in the report?
-Key Strategic Developments: The study also includes the key strategic developments of the market, comprising R&D, new product launch, M&A, agreements, collaborations, partnerships, joint ventures, and regional growth of the leading competitors operating in the market on a global and regional scale.
-Key Market Features: The report evaluated key market features, including revenue, price, capacity, capacity utilization rate, gross, production, production rate, consumption, import/export, supply/demand, cost, market share, CAGR, and gross margin. In addition, the study offers a comprehensive study of the key market dynamics and their latest trends, along with pertinent market segments and sub-segments.
-Analytical Tools: The Global CMP Polishing Materials Market report includes the accurately studied and assessed data of the key industry players and their scope in the market by means of a number of analytical tools. The analytical tools such as Porter’s five forces analysis, SWOT analysis, feasibility study, and investment return analysis have been used to analyze the growth of the key players operating in the market.
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The research includes historic data from 2016 to 2021 and forecasts until 2027 which makes the report an invaluable resource for industry executives, marketing, sales, and product managers, consultants, analysts, and stakeholders looking for key industry data in readily accessible documents with clearly presented tables and graphs.
Finally, the CMP Polishing Materials Market report is the believable source for gaining the market research that will exponentially accelerate your business. The report gives the principle locale, economic situations with the item value, benefit, limit, generation, supply, request and market development rate and figure and so on. CMP Polishing Materials industry report additionally Present new task SWOT examination, speculation attainability investigation, and venture return investigation.
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